NickelMaghrebV1, Main, Exploration, bibRecord, 000520

Characterisation of Ni and Ni/Ti contact on n-type 4H-SiC

Identifieur interne : 000520 ( Main/Exploration ); précédent : 000519; suivant : 000521

Characterisation of Ni and Ni/Ti contact on n-type 4H-SiC

Auteurs : M. Siad [Algérie] ; C. Pineda Vargas [Afrique du Sud] ; M. Nkosi [Afrique du Sud] ; D. Saidi [Algérie] ; N. Souami [Algérie] ; N. Daas [Algérie] ; A. C. Chami [Algérie]

Source :

Applied surface science [ 0169-4332 ] ; 2009.

RBID : Pascal:10-0346471

Descripteurs français

Pascal (Inist)
- Nickel, Semiconducteur type n, Contact ohmique, Métal transition, Titane, RBS, Diffraction RX, Spectrométrie Auger, Carbure de silicium, Ni, C Si, SiC, Ti, Composé minéral.
Wicri :
- topic : Nickel, Titane, Composé minéral.

English descriptors

KwdEn :
- AES, Inorganic compounds, Nickel, Ohmic contacts, RBS, Silicon carbide, Titanium, Transition elements, XRD, n type semiconductor.

Abstract

In this work, we report on the structural characterisation of Ni and Ni/Ti bilayer contacts on n-type 4H-SiC. The redistribution of carbon, after annealing, in the Ni/SiC and the Ni/Ti/SiC contacts is particularly studied by RBS at 3.2 MeV, XRD and AES techniques.

Affiliations:

Links toward previous steps (curation, corpus...)

to stream PascalFrancis, to step Corpus: 000149
to stream PascalFrancis, to step Curation: 000292
to stream PascalFrancis, to step Checkpoint: 000197
to stream Main, to step Merge: 000534
to stream Main, to step Curation: 000520

Le document en format XML

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<term>Inorganic compounds</term>
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<term>Ohmic contacts</term>
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<term>Silicon carbide</term>
<term>Titanium</term>
<term>Transition elements</term>
<term>XRD</term>
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<term>Contact ohmique</term>
<term>Métal transition</term>
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<term>RBS</term>
<term>Diffraction RX</term>
<term>Spectrométrie Auger</term>
<term>Carbure de silicium</term>
<term>Ni</term>
<term>C Si</term>
<term>SiC</term>
<term>Ti</term>
<term>Composé minéral</term>
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<front><div type="abstract" xml:lang="en">In this work, we report on the structural characterisation of Ni and Ni/Ti bilayer contacts on n-type 4H-SiC. The redistribution of carbon, after annealing, in the Ni/SiC and the Ni/Ti/SiC contacts is particularly studied by RBS at 3.2 MeV, XRD and AES techniques.</div>
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Characterisation of Ni and Ni/Ti contact on n-type 4H-SiC

Characterisation of Ni and Ni/Ti contact on n-type 4H-SiC

Source :

Descripteurs français

English descriptors

Abstract

Links toward previous steps (curation, corpus...)

Le document en format XML

Pour manipuler ce document sous Unix (Dilib)

Pour mettre un lien sur cette page dans le réseau Wicri